Titanium Rotary Sputtering Target

Material: High purity (99.5%, 99.99%, 99.995%), Grade 1, Grade 2, TiAl6V4
Shape: Tube ( Rotary target, OD: 20mm~160mm, Thickness: 2-20mm,
Length: custom-made OD>160, Thickness >8mm, length <200)
Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter

Our titanium rotary sputtering target has a high utilization rate of more than 75% that ensure you make full use of the target materials.

Due to special forming processes we used, our titanium sputtering targets possess higher density, fine grain sizes as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous titanium layers for thin-film applications.

Density is also an important factor in measuring the quality of titanium rotary targets. In order to reduce pores in the solids of the target and improve the properties of the sputtered film, the titanium rotary target is usually required to have a higher density.

Titanium Rotary Target Tube

Item Name	Ti target 99.999% Pure Ti Sputtering Titanium TargetTi target 99.999%
Purity	99.99%~99.995%
Shape	Round target/according to your request
Available size	OD:20~300mm, thickness: 5~60mm, length: 50~2000mm
Certificates	ISO9001:2008, SGS, The third test report
Technics	Forged and CNC Machined
Surface	CNC lathe surface.
Application	1. Electroplating;
	2. Chemical engineering & Petrochemical technology;
	3. Medical