Titanium sputtering target is a titanium product made of metal titanium, which is used for sputtering coating to produce titanium thin film.
Product Introduction
Tube target
Round target
Plate target
The main performance requirements of the Sputtering Target are as follows:
· Purity
Purity is one of the main performance indicators of targets. Baoji Xinjianchuang Metal provides high-purity (99.9%-99.995%) titanium sputtering targets, and provides complete metal target solutions for many customers in more than 10 countries around the world.
· Density
In order to reduce the pores in the target solid and improve the performance of the sputtered film, the target is usually required to have a higher density.
· Influence of target purity and material uniformity
The purity of the sputtering target has a great influence on the properties of the deposited films. The higher the purity of the target material, the better the performance of the coating. The impurity content in the target should be reduced as much as possible, the pollution source of the sputtered film should be reduced, and the uniformity of the film should be improved.
Welcome to send an inquiry to mira@xjcmetal.com at any time if you need.
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