Titanium（ Ti ）Sputtering Target

Grade： Titanium (Gr1, Gr2, Gr5, Gr7,GR12)
Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc
Titanium content： ≥99.5 (%)
Impurity content： <0.02 (%) Density： 4.51 or 4.50 g/cm3
Standard： ASTM B381; ASTM F67, ASTM F136
Size
1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;
2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm
3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm
4. Customized is available
Technique： Forged and CNC Machined
Application
Semiconductor sepa

The Titanium（ Ti ）Sputtering Target is made of titanium metal.As a metal, titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.

Product name	Titanium target for pvd coating machine
Grade	Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc
Origin	Baoji city Shaanxi Province china
Titanium content	≥99.5 (%)
Impurity content	<0.02 (%)
Density	4.51 or 4.50 g/cm3
Standard	ASTM B381; ASTM F67, ASTM F136
Size	1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available
Technique	Forged and CNC Machined
Application	Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.

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Titanium（ Ti ）Sputtering Target

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