Titanium Nitride Sputtering Target

Titanium nitride (TiN) (sometimes known as Tinite) is often used as a coating for titanium alloy, steel, carbide, and aluminum parts to improve the surface properties substrates.

Xinjianchuang Metal specializes in the production of high purity (99.99%) titanium nitride sputtering targets with the highest possible density. Titanium Nitride Sputtering Target and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large-area coating for solar energy or fuel cells and flip-chip applications.

Information of Titanium Nitride Sputtering Targets

Applications	• PVD (physical vapor deposition) and CVD (chemical vapor) deposition display • Semiconductor • Optical
Features	• High purity • Custom Sizes Available
Manufacturing Process	• Manufacturing - Cold-pressed - Sintered, Elastomer bonded to the backing plate • Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants Protection during shipment
Options	• 99% Minimum Purity